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BIDADI, H., SOBHANIAN, S., HASANLI, SH., MAZIDI, M., KARIMI, M.. (1383). STUDY OF THE DISTORTED LAYER STRUCTURE OF SILICON WAFERS BY THE METHOD OF PLASMA-CHEMICAL ETCHING AFTER MECHANICAL MACHINING PROCESSES. , 28(2), 227-234. doi: 10.22099/ijsts.2004.2873
H. BIDADI; S. SOBHANIAN; SH. HASANLI; M. MAZIDI; M. KARIMI. "STUDY OF THE DISTORTED LAYER STRUCTURE OF SILICON WAFERS BY THE METHOD OF PLASMA-CHEMICAL ETCHING AFTER MECHANICAL MACHINING PROCESSES". , 28, 2, 1383, 227-234. doi: 10.22099/ijsts.2004.2873
BIDADI, H., SOBHANIAN, S., HASANLI, SH., MAZIDI, M., KARIMI, M.. (1383). 'STUDY OF THE DISTORTED LAYER STRUCTURE OF SILICON WAFERS BY THE METHOD OF PLASMA-CHEMICAL ETCHING AFTER MECHANICAL MACHINING PROCESSES', , 28(2), pp. 227-234. doi: 10.22099/ijsts.2004.2873
BIDADI, H., SOBHANIAN, S., HASANLI, SH., MAZIDI, M., KARIMI, M.. STUDY OF THE DISTORTED LAYER STRUCTURE OF SILICON WAFERS BY THE METHOD OF PLASMA-CHEMICAL ETCHING AFTER MECHANICAL MACHINING PROCESSES. , 1383; 28(2): 227-234. doi: 10.22099/ijsts.2004.2873


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